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Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution) Kiʻi Hōʻikeʻike
  • Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Hoʻonā wai)

Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Hoʻonā wai)

ʻO ka wehewehe pōkole:

Tetramethylammonium Hydroxide (25% Waiwai)

Synonyms: TMAH

CAS: 75-59-2

ʻIke: 24.5-25.5%

Ke ʻano: wai kala ʻole

Nā Paʻakai Ammonium Quaternary, Mea Kiʻekiʻe

Hoʻokaʻaʻike: Kauka Alvin Huang

Mobile/Wechat/WhatsApp: +86-15026746401

E-Mail: alvin@ruifuchem.com


Huahana Huahana

Nā Huahana Pili

Huahana Huahana

wehewehe:

Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) with high quality, commercial production. We can provide Certificate of Analysis (COA), Safety Data Sheet (SDS), worldwide delivery, small and bulk quantities available, strong after-sale service. Welcome to order. Please contact: alvin@ruifuchem.com

Na Waiwai Kemika:

Inoa Kimia Tetramethylammonium Hydroxide (25% Waiwai)
Nā huaʻōlelo like TMAH (25% Waiwai)
Helu CAS 75-59-2
Helu CAT RF-PI1749
Kūlana Kūʻai Ma ka waihona, hoʻonui ʻia a hiki i nā tona
ʻĀpana Molekala (CH3)4NOH
Kaumaha Molecular 91.15
Papa kuhikuhi (N20/D) 1.378~1.384
ʻala ʻO ka ʻala e like me Ammonia ikaika
ʻŌlelo Aʻo Pilikino ʻAʻohe Kiʻekiʻe!ʻO ka wai wela!
Brand Kemika Ruifu

Nā kikoʻī:

'ikamu Nā kikoʻī
Ka nana aku Wai kala ʻole
Hoʻāʻo
 24.5~25.5% (Assay by Titration)
Klorida <500ppm
Pāuma (K) <5ppm
Sodium (Na) <5ppm
kalakala <50APHA
Kūlana hoʻāʻo Kūlana ʻoihana
Hoʻohana no ka noiʻi Photoresist

Pūʻolo a me ka waiho ʻana:

Pūʻolo: 25kg / Drum, a i ʻole e like me ka makemake o ka mea kūʻai aku.

Kūlana mālama:E mālama i loko o nā pahu i hoʻopaʻa ʻia ma kahi maloʻo a maloʻo;E pale i ka malamalama a me ka wai.

Pono:

1

FAQ:

Noi:

ʻO Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) he paʻakai ammonium quaternary i hoʻohana mau ʻia ma ke ʻano he anisotropic etchant no ke silika ma muli o kona kiʻekiʻe kiʻekiʻe kiʻekiʻe etching kiʻekiʻe, mea hoʻoheheʻe kumu i ka hoʻomohala ʻana i ka photoresist acidic i ke kaʻina photolithography, ma ke ʻano he surfactant i loko. ka synthesis o ka ferrofluid a ma ke ʻano he polarographic reagent.Loaʻa iā ia ka noi i ka hana ʻana i ka silika organik, kahi e hoʻohana ʻia ai no ka hoʻomaʻemaʻe ʻana i ka ʻili o ka ʻili silicon wafer.Hoʻopili pū ʻia i ka hoʻomaʻemaʻe ʻana i kekahi mau mea metala.

E kākau i kāu leka ma aneʻi a hoʻouna mai iā mākou