Hexamethyldisilazane (HMDS) CAS 999-97-3 Purity > 99.0% (GC)
Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of Hexamethyldisilazane (HMDS) (CAS: 999-97-3) with high quality. We can provide COA, worldwide delivery, small and bulk quantities available. Please contact: alvin@ruifuchem.com
| Tshuaj npe | Hexamethyldisilazane |
| Synonyms | HMDS;1,1,1,3,3,3-Hexamethyldisilazane;Hexamethyl Disilylamine |
| CAS Nr | 999-97-3 |
| CAT Number | Qauv TSIS MUAJ: RF-PI2071 |
| Tshuag xwm txheej | Hauv Tshuag, Muaj Peev Xwm Ntau Lawm 3000MT / Xyoo |
| Molecular Formula | C6H19NSi2 |
| Molecular Luj | 161.40 Nws |
| Melting Point | -78 ℃ |
| Boiling Point | 123.0 ~ 126.0 ℃ (lit.) |
| Flash Point | 8 ℃ (lit.) |
| rhiab heev | Moisture Sensitive.Hygroscopic |
| Solubility (Muscible nrog) | Ether, Benzene |
| Dej Solubility | Reacts Nrog Dej |
| Hom | Ruifu Tshuaj |
| Yam khoom | Specifications |
| Qhov tshwm sim | Colorless Transparent Liquid, Tsis muaj Suspended Tshuaj los yog Mechanical Impurity |
| Purity / Analysis Method | > 99.0% (GC) |
| Refractive Index n20/D | 1.406-1.409 Nws |
| Lub ntiajteb txawj nqus (20/20 ℃) | 0.772 ~ 0.776 hli |
| Infrared Spectrum | Raws li tus qauv |
| Tag nrho cov impurities | <1.00% |
| Xim kuaj | 0 ~ 20 |
| Test Standard | Enterprise Standard |
Pob:Hlau puab yas-txhaj nruas, 150kg net txhua, los yog raws li tus neeg yuav tsum tau muaj
Cia txias:Khaws rau hauv cov thawv ntim khoom ntawm qhov chaw txias thiab qhuav;Tiv thaiv los ntawm lub teeb thiab noo noo
Hexamethyldisilazane (HMDS) (CAS: 999-97-3), alkaline silanizing tiv thaiv, inorganic kho tus neeg sawv cev ntawm cov khoom.Hexamethyldisilazane yog ib qho organo silicon compound, ua tus neeg saib xyuas zoo heev.Nws yog ib qho reagent rau kev npaj ntawm trimethylsilyl derivatives.HMDS tuaj yeem siv rau silanizing nto ntawm silicon dej, cellulose.HMDS tseem tuaj yeem siv los ua kom lub cev qhuav dej ntawm cov khoom siv biomaterials rau scanning electron microscopy (SEM).Lub hexamethyldisilazane txheej txheej ntawm ntau yam nanoparticles ua rau lawv tiv taus dej paug thiab flocculation thaum lub sijhawm sib xyaw.HMDS kuj tseem siv tau los ua tus hloov kho los tswj cov duab, tsim ntawm agglomerates nto thaj chaw thiab qhov pore loj ntawm silica hais.HMDS yog ib qho adhesion txhawb nqa rau photoresist nyob rau hauv photolithography, thiab tseem muaj txiaj ntsig zoo hauv pyrolysis-gas chromatography-mass spectrometry los txhim kho qhov kev tshawb pom ntawm cov tebchaw nrog cov pawg polar functional.Nyob rau hauv lub xub ntiag ntawm ib tug catalyst, nws reacts nrog cawv los yog phenols los tsim trimethylalkoxysilane los yog trimethylaroxysilane.Reacts nrog anhydrous hydrogen chloride, tso NH3 los yog NH4Cl, los tsim trimethylchlorosilane.Soluble nyob rau hauv cov kuab tshuaj organic, nws yuav sai sai hydrolyzed nyob rau hauv kev sib cuag nrog huab cua tsim trimethylsilanol thiab hexamethyldisilyl ether.Deactivation ntawm cov ntaub ntawv txhawb nqa chromatographic.Hexamethyldisilazane tsuas yog siv los ua methyl silane alkylation (xws li amikacin, penicillin, cephalosporins thiab hom penicillin derivatives), hydroxyl tiv thaiv cov tshuaj tua kab mob.Nws yog siv los ua tus neeg sawv cev kho deg ntawm diatomite, dawb carbon dub, titanium thiab blond additives ntawm photoresist hauv kev lag luam semiconductor.Nws yog siv los ua tus neeg sawv cev kho mob ntawm tearing zog kuj.HMDS yog siv los ua cov kuab tshuaj hauv cov organic synthesis thiab organometallic chemistry.HMDS yog siv rau kev npaj ntawm trimethylsilyl ethers los ntawm hydroxy compounds.Nws yog siv los ua lwm txoj rau qhov tseem ceeb ntawm qhov ziab kom qhuav thaum lub sij hawm ua qauv npaj hauv electron microscopy.Nws yog ntxiv rau cov tshuaj ntsuam xyuas kom tau txais cov khoom kuaj mob silylated thaum lub sij hawm pyrolysis hauv cov roj chromatography- huab hwm coj spectrometry.
