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Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution) Ata Fa'aalia
  • Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Vaivai Fofo)

Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Vaivai Fofo)

Fa'amatalaga Puupuu:

Tetramethylammonium Hydroxide (25% Vaivai Fofo)

Synonyms: TMAH

CAS: 75-59-2

Su'ega: 24.5~25.5%

Fa'aaliga: Suavai e leai ni lanu

Quaternary Ammonium Salts, Tulaga Maualuga

Fa'afeso'ota'i: Dr. Alvin Huang

Mobile/Wechat/WhatsApp: +86-15026746401

E-Mail: alvin@ruifuchem.com


Fa'amatalaga Oloa

Oloa Fa'atatau

Faailoga o oloa

Fa'amatalaga:

Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) with high quality, commercial production. We can provide Certificate of Analysis (COA), Safety Data Sheet (SDS), worldwide delivery, small and bulk quantities available, strong after-sale service. Welcome to order. Please contact: alvin@ruifuchem.com

Meatotino tau vailaau:

Igoa Vailaau Tetramethylammonium Hydroxide (25% Vaivai Fofo)
Synonyms TMAH (25% Vaivai Fofo)
Numera CAS 75-59-2
CAT Numera RF-PI1749
Tulaga Fa'asoa I Fa'atauga, Oloa Fua e O'o i Tone
Fuafua mole (CH3)4NOH
Molecular Weight 91.15
Fa'asino Upu (N20/D) 1.378~1.384
Sogisogi Malosi e Pei o Amonia Sogisogi
Lapataiga o Tulaga Lamatia Oona Sili!Suavai mumu!
Fa'ailoga Ruifu Chemical

Fa'amatalaga:

Aitema Fa'amatalaga
Fa'aaliga Suavai le lanu
Su'ega
 24.5~25.5% (Su'esu'e e ala i le Fa'asusu)
Klorida <500ppm
Patala (K) <5ppm
Sodium (Na) <5ppm
Lanu <50APHA
Tulaga Su'ega Pisinisi Tulaga
Fa'aoga mo Su'esu'ega Photoresist

Paket & Teuina:

afifi: 25kg/Drum, pe tusa ai ma manaoga o tagata faatau.

Tulaga teuina:Teu i totonu o pusa faʻamaufaʻailoga i se nofoaga malulu ma mago;Puipui mai le malamalama ma le susu.

Tulaga lelei:

1

FAQ:

Talosaga:

Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) o se masima ammonium quaternary e masani ona faʻaaogaina e avea o se etchant anisotropic mo le silikoni ona o lona maualuga maualuga etching rate, solvent faavae i le atinaʻeina o photoresist acidic i photolithography process, e pei o le surfactant i totonu. le tuufaatasia o le ferrofluid ma e pei o se reagent polarographic.E maua ai le fa'aogaina i le gaosiga o le silicon organic, lea e fa'aaogaina mo le fa'amalamaina o luga o luga o le kosikoni komipiuta ma le mea fa'amama.E aofia ai foi i le faamamaina o nisi elemene uʻamea.

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