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Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution) Featured Image
  • Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution)

Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution)

Tsanangudzo Pfupi

Tetramethylammonium Hydroxide (25% Aqueous Solution)

Anoreva zvakafanana: TMAH

CAS: 75-59-2

Chiyero: 24.5 ~ 25.5%

Chitarisiko: Mvura isina Ruvara

Quaternary Ammonium Salts, High Quality

Bata: Dr. Alvin Huang

Nharembozha/Wechat/WhatsApp: +86-15026746401

E-Mail: alvin@ruifuchem.com


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Tsanangudzo:

Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) with high quality, commercial production. We can provide Certificate of Analysis (COA), Safety Data Sheet (SDS), worldwide delivery, small and bulk quantities available, strong after-sale service. Welcome to order. Please contact: alvin@ruifuchem.com

Chemical Properties:

Chemical Name Tetramethylammonium Hydroxide (25% Aqueous Solution)
Mashoko anoreva zvakafanana TMAH (25% Aqueous Solution)
Nhamba yeCAS 75-59-2
Nhamba yeCAT RF-PI1749
Stock Status MuStock, Kugadzirwa Kunokwira Kusvika Matani
Molecular Formula (CH3)4NOH
Molecular Weight 91.15
Refractive Index (N20/D) 1.378~1.384
Kunhuwa Yakasimba Ammonia-Sekunhuwa
Yambiro Yengozi Highly Toxic!Flammable Liquid!
Brand Ruifu Chemical

Zvinotsanangurwa:

Item Zvinotsanangurwa
Chitarisiko Colorless Liquid
Assay
 24.5 ~ 25.5% (Assay by Titration)
Chloride <500ppm
Potassium (K) <5ppm
Sodium (Na) <5ppm
Color <50APHA
Test Standard Enterprise Standard
Usage ye Photoresist Research

Package & Kuchengeta:

Package: 25kg / Drum, kana zvinoenderana nezvinodiwa nemutengi.

Storage Condition:Chengetedza mumidziyo yakavharwa panzvimbo inotonhorera uye yakaoma;Dzivirira kubva kuchiedza uye unyoro.

Zvakanakira:

1

FAQ:

Application:

Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) inonzi quaternary ammonium munyu inowanzoshandiswa seanisotropic etchant yesilicon nekuda kwekukwira kwayo kwesilicon etching rate, basic solvent mukugadzirwa kwe acidic photoresist mu photolithography process, se surfactant mu. iyo synthesis ye ferrofluid uye se polarographic reagent.Inowana kushandiswa mukugadzira organic silicon, kwainoshandiswa komputa silicon wafer pamusoro inopenya uye yekuchenesa mumiririri.Inobatanidzwawo mukunatswa kwezvimwe zvinhu zvesimbi.

Nyora meseji yako pano uye titumire kwatiri