Tetramethylammonium Hydroxide (TMAH) CAS 75-59-2 (25% Aqueous Solution)
Shanghai Ruifu Chemical Co., Ltd. is the leading manufacturer and supplier of Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) with high quality, commercial production. We can provide Certificate of Analysis (COA), Safety Data Sheet (SDS), worldwide delivery, small and bulk quantities available, strong after-sale service. Welcome to order. Please contact: alvin@ruifuchem.com
Ngaran Kimia | Tetramethylammonium Hydroxide (25% Larutan Cai) |
sinonim | TMAH (25% Aqueous Solution) |
Nomer CAS | 75-59-2 |
Nomer CAT | RF-PI1749 |
Status saham | Dina Stok, Skala Produksi Nepi ka Ton |
Formula Molekul | (CH3)4NOH |
Beurat Molekul | 91.15 |
Indéks réfraktif (N20/D) | 1.378~1.384 |
Bau | Kuat Amonia-Kawas Bau |
Perhatosan Bahaya | Kacida toksik!Cairan anu gampang kaduruk! |
merek | Kimia Ruifu |
Barang | spésifikasi |
Penampilan | Cairan teu warnaan |
Assay | 24,5 ~ 25,5% (Assay ku Titrasi) |
Klorida | <500ppm |
Kalium (K) | <5ppm |
Natrium (Na) | <5ppm |
Warna | <50APHA |
Standar tés | Standar Perusahaan |
Pamakéan | pikeun Photoresist Panalungtikan |
Bungkusan: 25kg / Drum, atawa nurutkeun sarat customer urang.
Kaayaan Panyimpenan:Simpen dina wadah anu disegel dina tempat anu tiis sareng garing;Ngajaga tina cahaya sareng Uap.
Tetramethylammonium Hydroxide (TMAH) (CAS: 75-59-2) nyaéta uyah amonium kuartener umumna dipaké salaku etchant anisotropic pikeun silikon alatan laju etching silikon na tinggi, pangleyur dasar dina ngembangkeun photoresist asam dina prosés photolithography, salaku surfaktan dina sintésis ferrofluida sarta salaku réagen polarographic.Éta mendakan aplikasi dina produksi silikon organik, dimana éta dianggo pikeun pencerah permukaan wafer silikon komputer sareng agén beberesih.Éta ogé aub dina purifikasi sababaraha unsur logam.